Radiation hard and cold-spare

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Radiation hard and cold-spare ESD solutions

Sofics has supported several companies in the past on radiation tolerant applications and other harsh environments. We worked both on prevention of Single Event Latch-up and on prevention of degradation due to Total dose irradiation.

Examples

Sofics ESD technology and knowledge used for rad-hard applications

We have provided our Analog IOs and ESD clamps to CERN for use in their experiments. They have sourced technology from us in 130nm, 65nm and 28nm.

We have delivered ESD clamps to a large US based FPGA maker that sources its solutions to aerospace applications. They ran tests (@ Berkeley) on our 65nm solutions and did not see failures up to 120 LET

We have supported a few companies in their ASIC design for use in satellites.

We have supported companies developing radiation hard products or libraries

Mature CMOS (0.5um to 180nm)

Process Pad ESD robustness Leakage
TSMC 180nm 5V rail > 8 kV HBM < 5 nA
TSMC 180nm 5V I/O > 8 kV HBM < 5 nA
TSMC 180nm 7V I/O > 2 kV HBM < 50 nA
TowerSemi 350nm 4.5V rail > 8 kV HBM < 100 pA

Mainstream CMOS (130nm to 65nm)

Process pad ESD robustness Leakage
TSMC 130nm 5V rail > 3 kV HBM < 1 nA
TSMC 130nm 5V I/O > 3 kV HBM < 1 nA
TSMC 130nm 7V I/O > 4 kV HBM < 1 nA
TSMC 65nm 5V I/O OVT > 4 kV HBM < 1 nA
TSMC 65nm 5V I/O > 4 kV HBM < 100 nA

Advanced CMOS (40nm to 22nm)

Process Pad ESD robustness Leakage
TSMC 40nm 5V rail > 2 kV HBM < 10 nA
TSMC 40nm 5V I/O > 2 kV HBM < 10 nA
TSMC 28nm 3.9V I/O > 2 kV HBM < 50 pA
TSMC 28nm 5.5V I/O > 2 kV HBM < 400 pA
TSMC 28nm 6.5V I/O > 2 kV HBM < 400 pA
TSMC 28nm 12V I/O > 2 kV HBM < 40 nA
UMC 28nm 8.6V I/O > 500V HBM < 1 uA

FinFET technology

Process Pad ESD robustness Leakage
TSMC 16nm 5V rail > 1 kV HBM < 30 nA
TSMC 16nm 5V I/O > 1 kV HBM < 30 nA
TSMC 12nm 3.3V rail > 3 kV HBM < 60 nA
TSMC 12nm 5V I/O > 4 kV HBM < 3 uA
TSMC 7nm 3.3V rail > 2 kV HBM < 1.5 uA
TSMC 5nm 1.8V rail > 1 kV HBM < 500 pA

SOI technology

Process Pad ESD robustness Leakage
GF 22FDX 3.3V rail > 5 kV HBM < 10 pA
GF 22FDX 3.3V I/O > 2 kV HBM < 500 pA
GF 22FDX 5V rail > 4 kV HBM < 10 nA

BiCMOS technology

Process Pad ESD robustness Parasitic capacitance
TSMC 130nm 1.2V I/O > 4 kV HBM < 100 fF
TSMC 130nm 1.2V I/O OVT > 2 kV HBM < 50 fF
UMC 130nm 1.2V I/O > 2 kV HBM < 150 fF
TSMC 90nm 3.3V I/O > 2kV HBM < 100 fF
TSMC 65nm 1.8V I/O > 4 kV HBM < 100 fF
TSMC 65nm 1.0V I/O > 3 kV HBM < 70 fF
GF 65nm 1.2V I/O > 2 kV HBM < 50 fF
GF 65nm 3.3V I/O > 2 kV HBM < 50 fF

Customer quotes

Further reading